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MAMS CMP SYSTEM
   
MAT ARW-461M

For　ｄiversified　MEMS　process　requirement,　MAT　designed special　CMP　tool.　New　designed　carrier　can　applied　extremely　low　down　force　control.　The　detail　specification will　be　determined　based　on　customer's　requirement.


■Up　to　6"　Wafer.

■Special　low　down　force　control　by　new　designed　carrier.

■10　recipes　storage.

■Switchable　conditioner　layout

■Small　footprint

■Customized　set　up　is　available.
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Glass Polishing Machine
   
MAT 1700P-2M
■Manual loading and unloading.

■Up to 730×920ｍｍ glass polishing is available

■The demonstration test is possible.
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Step-less Currature Facing by Origunal Control System
   
MAT ARW-3
■Step-less curvature facing by original control system.

■High straightness Facing (X) axis feed.

■Original design Z-axis feed without backlash.

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MAT ARW-2400
   
MAT ARW-2400
■2400mm diameter plate for pitch polishing.

■For extreamely high flatness glass polishing.

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